JPH0215635B2 - - Google Patents
Info
- Publication number
- JPH0215635B2 JPH0215635B2 JP61044280A JP4428086A JPH0215635B2 JP H0215635 B2 JPH0215635 B2 JP H0215635B2 JP 61044280 A JP61044280 A JP 61044280A JP 4428086 A JP4428086 A JP 4428086A JP H0215635 B2 JPH0215635 B2 JP H0215635B2
- Authority
- JP
- Japan
- Prior art keywords
- plating
- bath
- metal
- plating tank
- copper
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007747 plating Methods 0.000 claims description 52
- 229910052751 metal Inorganic materials 0.000 claims description 23
- 239000002184 metal Substances 0.000 claims description 23
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 21
- 229910052802 copper Inorganic materials 0.000 claims description 20
- 239000010949 copper Substances 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 20
- 238000012360 testing method Methods 0.000 claims description 16
- 238000007772 electroless plating Methods 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 12
- 238000007654 immersion Methods 0.000 claims description 6
- 239000000758 substrate Substances 0.000 description 16
- 239000010410 layer Substances 0.000 description 11
- 238000000576 coating method Methods 0.000 description 9
- 230000008569 process Effects 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 8
- 230000007423 decrease Effects 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 206010070834 Sensitisation Diseases 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 230000008313 sensitization Effects 0.000 description 4
- 239000002356 single layer Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 230000002950 deficient Effects 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000004615 ingredient Substances 0.000 description 3
- 238000010899 nucleation Methods 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- BDDLHHRCDSJVKV-UHFFFAOYSA-N 7028-40-2 Chemical compound CC(O)=O.CC(O)=O.CC(O)=O.CC(O)=O BDDLHHRCDSJVKV-UHFFFAOYSA-N 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- KXZJHVJKXJLBKO-UHFFFAOYSA-N chembl1408157 Chemical compound N=1C2=CC=CC=C2C(C(=O)O)=CC=1C1=CC=C(O)C=C1 KXZJHVJKXJLBKO-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- UETQVDZZPKAQIC-UHFFFAOYSA-N chlorane Chemical compound Cl.Cl.Cl.Cl UETQVDZZPKAQIC-UHFFFAOYSA-N 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 229910001431 copper ion Inorganic materials 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 238000012549 training Methods 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1675—Process conditions
- C23C18/1683—Control of electrolyte composition, e.g. measurement, adjustment
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
- H05K3/187—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating means therefor, e.g. baths, apparatus
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/740,922 US4626446A (en) | 1985-06-03 | 1985-06-03 | Electroless plating bath monitor |
| US740922 | 1991-08-06 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61279681A JPS61279681A (ja) | 1986-12-10 |
| JPH0215635B2 true JPH0215635B2 (en]) | 1990-04-12 |
Family
ID=24978616
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61044280A Granted JPS61279681A (ja) | 1985-06-03 | 1986-03-03 | 無電解めっき槽のめっき能力測定方法と装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4626446A (en]) |
| EP (1) | EP0204166B1 (en]) |
| JP (1) | JPS61279681A (en]) |
| CA (1) | CA1225549A (en]) |
| DE (1) | DE3662278D1 (en]) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4692346A (en) * | 1986-04-21 | 1987-09-08 | International Business Machines Corporation | Method and apparatus for controlling the surface chemistry on objects plated in an electroless plating bath |
| US4707378A (en) * | 1986-07-11 | 1987-11-17 | International Business Machines Corporation | Method and apparatus for controlling the organic contamination level in an electroless plating bath |
| EP0265895B1 (en) * | 1986-10-31 | 1993-02-10 | AMP-AKZO CORPORATION (a Delaware corp.) | Method for electrolessly depositing high quality copper |
| US4908242A (en) * | 1986-10-31 | 1990-03-13 | Kollmorgen Corporation | Method of consistently producing a copper deposit on a substrate by electroless deposition which deposit is essentially free of fissures |
| US4842886A (en) * | 1987-11-04 | 1989-06-27 | International Business Machines Corporation | Method for electroless plating |
| US4808431A (en) * | 1987-12-08 | 1989-02-28 | International Business Machines Corp. | Method for controlling plating on seeded surfaces |
| US5484626A (en) * | 1992-04-06 | 1996-01-16 | Shipley Company L.L.C. | Methods and apparatus for maintaining electroless plating solutions |
| US5993892A (en) * | 1996-09-12 | 1999-11-30 | Wasserman; Arthur | Method of monitoring and controlling electroless plating in real time |
| JP4672189B2 (ja) * | 2001-06-11 | 2011-04-20 | 凸版印刷株式会社 | 配線基板または半導体回路の製造方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3375178A (en) * | 1964-05-28 | 1968-03-26 | Continental Oil Co | Method of confirming the occurrence of plating in electroless nickel-plating |
| US4006063A (en) * | 1970-10-08 | 1977-02-01 | Minas Ensanian | Method for measuring surface characteristics of metals and metalloids |
| FR2136999B1 (en]) * | 1971-05-11 | 1973-05-11 | Radiotechnique Compelec | |
| GB1585057A (en) * | 1976-06-28 | 1981-02-25 | Ici Ltd | Sensing concentration of coating solution |
| US4125642A (en) * | 1977-08-25 | 1978-11-14 | The United States Of America As Represented By The United States Department Of Energy | Method for conducting electroless metal-plating processes |
| JPS5926660B2 (ja) * | 1979-03-07 | 1984-06-29 | 株式会社東芝 | 無電解メツキ反応の測定方法 |
| US4477484A (en) * | 1982-12-10 | 1984-10-16 | International Business Machines Corporation | Electroless plating monitor |
-
1985
- 1985-06-03 US US06/740,922 patent/US4626446A/en not_active Expired - Fee Related
-
1986
- 1986-03-03 JP JP61044280A patent/JPS61279681A/ja active Granted
- 1986-04-11 CA CA000506444A patent/CA1225549A/en not_active Expired
- 1986-05-06 EP EP86106187A patent/EP0204166B1/en not_active Expired
- 1986-05-06 DE DE8686106187T patent/DE3662278D1/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61279681A (ja) | 1986-12-10 |
| EP0204166A2 (en) | 1986-12-10 |
| DE3662278D1 (en) | 1989-04-13 |
| EP0204166B1 (en) | 1989-03-08 |
| CA1225549A (en) | 1987-08-18 |
| US4626446A (en) | 1986-12-02 |
| EP0204166A3 (en) | 1987-04-01 |
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